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Photoelectrochemical study of influence factors on corrosion resistance of cupronickel B30 in simulated water

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模拟水中白铜B30耐蚀性影响因素的光电化学研究.pdf (469.1Kb)
Date
2007
Author
Xu Qun-Jie
徐群杰
Wan Zong-Yue
万宗跃
Yin Ren-He
印仁和
Zhu Lue-Jun
朱律均
Cao Wei-Min
曹为民
Zhou Guo-Ding
周国定
Lin Chang-Jian
林昌健
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  • 化学化工-已发表论文 [14469]
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Abstract
Influence factors on semiconduction properties of oxide films on a cupronickel electrode in the simulated water was studied by cyclic voltammetry and photocurrent response method. The cupronickel electrode showed p-type photoresponse, which came from CU2O layer on its surface. The photoresponse changed to n-type in the simulated water. The transition from p-type to n-type might be related to the doping of Cl- and SO42- anions into CU2O film. It did not show n-type photoresponse when the cupronickel electrode was immersed in the simulated water containing some sulfide. It was shown that the degree of corrosion increased with the concentration of these anions and temperature. In addition, as the pH increased between 7 and 9, the corrosion resistance of B30 was enhanced, while it lowered as the pH was beyond 9.
Citation
ACTA CHIMICA SINICA,2007,65(18):1981-1986
URI
http://dx.doi.org/doi:CNKI:SUN:HXXB.0.2007-18-012
https://dspace.xmu.edu.cn/handle/2288/9283

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