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dc.contributor.authorZhang, Li
dc.contributor.authorMa, Xin Z.
dc.contributor.authorZhuang, Jin L.
dc.contributor.authorQiu, Chuan K.
dc.contributor.authorDu, Chun L.
dc.contributor.authorTang, Jing
dc.contributor.author汤儆
dc.contributor.authorTian, Zhao W.
dc.contributor.author田昭武
dc.date.accessioned2011-05-28T02:46:11Z
dc.date.available2011-05-28T02:46:11Z
dc.date.issued2007-11
dc.identifier.citationADVANCED MATERIALS,2007,19(22):3912-3918zh_CN
dc.identifier.issn0935-9648
dc.identifier.urihttp://dx.doi.org/doi:10.1002/adma.200700300
dc.identifier.urihttps://dspace.xmu.edu.cn/handle/2288/9222
dc.description.abstractA first example of the fabrication of large-scale diffractive microlens arrays on n-GaAs using an efficient electro-chemical technique named CELT (confined etchant layer technique) is reported. This microlens array is an eight-phase level diffractive optic device with eight concentric rings and seven steps in one lenslet. When appropriate chemical solutions and etching conditions are chosen, an approximate copy of the diffractive microlens array on the quartz is transferred onto the n-GaAs.zh_CN
dc.language.isoenzh_CN
dc.publisherWILEY-V C H VERLAG GMBHzh_CN
dc.titleMicrofabrication of a diffractive microlens array on n-GaAs by an efficient electrochemical methodzh_CN
dc.typeArticlezh_CN


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