A new method for inner surface modification by plasma source ion implantation (PSII)
- 物理技术－已发表论文 
A new method for inner surface modification. named grid-enhanced inner surface modification by plasma source ion implantation (PSII), was proposed and demonstrated in this paper. By introducing an RF plasma core, which is produced between a central cathode and a coaxial grid electrode, and sputtering the cathode, uniform ion implantation and film deposition on the inner surface of a tubular sample can be realized based upon the PSII technique. (C) 2001 Elsevier Science B.V. All rights reserved.