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dc.contributor.authorLiu, Jiezh_CN
dc.contributor.authorHebert, Clementzh_CN
dc.contributor.authorPham, Pascalezh_CN
dc.contributor.authorSauter-Starace, Fabienzh_CN
dc.contributor.authorHaguet, Vincentzh_CN
dc.contributor.authorLivache, Thierryzh_CN
dc.contributor.authorMailley, Pascalzh_CN
dc.contributor.author刘婕zh_CN
dc.date.accessioned2015-07-22T03:20:02Z
dc.date.available2015-07-22T03:20:02Z
dc.date.issued2012-05-07zh_CN
dc.identifier.citationSMALL, 2012,8(9):1345-1349zh_CN
dc.identifier.otherWOS:000303445400008zh_CN
dc.identifier.urihttps://dspace.xmu.edu.cn/handle/2288/88589
dc.descriptionANR agency under PNANO [PRECIS ANR-08-NANO-049-02]; National Natural Science Foundation of China [50903067]zh_CN
dc.language.isoen_USzh_CN
dc.publisherSMALLzh_CN
dc.source.urihttp://dx.doi.org/10.1002/smll.201102327zh_CN
dc.subjectFABRICATIONzh_CN
dc.subjectSILICONzh_CN
dc.titleElectrochemically Induced Maskless Metal Deposition on Micropore Wallzh_CN
dc.typeArticlezh_CN


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