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dc.contributor.authorM.RostomAlizh_CN
dc.contributor.authorMd.ZiaurRahmanzh_CN
dc.contributor.authorS.SankarSahazh_CN
dc.contributor.authorM. Rostom Alizh_CN
dc.contributor.authorMd. Ziaur Rahmanzh_CN
dc.contributor.authorS. SankarSahazh_CN
dc.date.accessioned2014-04-22T08:10:57Z
dc.date.available2014-04-22T08:10:57Z
dc.date.issued2014-04-28zh_CN
dc.identifier.citation电化学,2014,20(2):139-145.zh_CN
dc.identifier.issn1006-3471zh_CN
dc.identifier.urihttp://dx.doi.org/10.13208/j.electrochem.130714zh_CN
dc.identifier.urihttps://dspace.xmu.edu.cn/handle/2288/79787
dc.description.abstract采用恒电流和恒电位方法,基于含有氯化铜溶液的乙二醇-氯化胆碱或硫脲-氯化胆碱离子液体,室温下在钢阴极上进行了铜的电沉积. 利用扫描电子显微镜和X-射线衍射技术研究了各种实验条件对电沉积的影响以及沉积层的形貌. 结果表明,室温下施加不超过-0.45 V的沉积电位和不超过-4.0 A·m-2的沉积电流密度,可以同时从氯化胆碱基乙二醇和硫脲离子液体中沉积得到非常光滑、有光泽、致密且具有良好结合力、色泽鲜艳的铜金属涂层. 铜的电沉积阴极电流效率约为97%.zh_CN
dc.description.abstractThe electrodeposition of copper from a solution containing copper chloride in either an ethylene glycol (EG)-choline chloride based or a urea-choline chloride based ionic liquid has been carried out onto a steel cathode by constant current and constant potential methods at room temperature. The influences of various experimental conditions on electrodeposition and the morphology of the deposited layers have been investigated by scanning electron microscopy (SEM) and X-ray diffraction (XRD). It is shown that very smooth, shiny and dense with good adherence and bright metallic coloured copper coatings can be obtained from both EG and urea based ionic liquids at the applied deposition potentials up to -0.45 V and applied deposition current densities up to -4.0 A·m-2 at room temperature. The cathodic current efficiency for the deposition of copper is about 97%.zh_CN
dc.description.sponsorshipThe authors gratefully acknowledge the Ministry of Science and Technology, the People's Republic of Bangladesh for financial support of this work(Grand Reference No. MOSICT/PRC-24/2009-2010/BS-52/172).  zh_CN
dc.description.sponsorshipThe authors gratefully acknowledge the Ministry of Science and Technology, the People's Republic of Bangladesh for financial support of this work(Grand Reference No. MOSICT/PRC-24/2009-2010/BS-52/172).zh_CN
dc.language.isozhzh_CN
dc.publisher厦门大学《电化学》编辑部zh_CN
dc.relation.ispartofseries研究论文zh_CN
dc.relation.ispartofseriesArticleszh_CN
dc.source.urihttp://electrochem.xmu.edu.cn/CN/abstract/abstract10057.shtmlzh_CN
dc.subject电沉积zh_CN
dc.subject乙二醇-氯化胆碱zh_CN
dc.subject硫脲-氯化胆碱zh_CN
dc.subjectzh_CN
dc.subject循环伏安法zh_CN
dc.subjectelectrodepositionzh_CN
dc.subjectethalinezh_CN
dc.subjectrelinezh_CN
dc.subjectcopperzh_CN
dc.subjectcyclic voltammetryzh_CN
dc.title基于氯化胆碱离子液体的铜电沉积研究(英文)zh_CN
dc.title.alternativeElectrodeposition of Copper from a Choline Chloride based Ionic Liquidzh_CN
dc.typeArticlezh_CN
dc.description.note作者联系地址:拉杰沙希大学应用化学和化学工程系,拉杰沙希-6205, 孟加拉国zh_CN
dc.description.noteAuthor's Address: Department of Applied Chemistry and Chemical Engineering, University of Rajshahi, Rajshahi-6205, Bangladeshzh_CN
dc.description.note通讯作者E-mail:dmrali@yahoo.comzh_CN


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