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dc.contributor.authorJing Tang
dc.contributor.authorLi Zhang
dc.contributor.authorLi M. Jiang
dc.contributor.authorLei Xie
dc.contributor.authorYan B. Zu
dc.contributor.authorZhao W. Tian
dc.contributor.author田昭武
dc.date.accessioned2014-03-21T01:15:08Z
dc.date.available2014-03-21T01:15:08Z
dc.date.issued2007-01-16
dc.identifier.urihttps://dspace.xmu.edu.cn/handle/2288/71640
dc.descriptionContacting Author: Zhao W. Tian is with the State key laboratory for Physical Chemistry of Solid Surfaces, Xiamen, China (phone: 86-592-2185797; fax: 86-592-2085349; email: zwtian@xmu.edu.cn)zh_CN
dc.language.isoenzh_CN
dc.relation.ispartofseriesProceedings of the 2nd IEEE International Conference on Nano/Micro Engineered and Molecular SystemsJanuary 16 - 19, 2007, Bangkok, Thailandzh_CN
dc.titleThree-dimensional Electrochemical Micromachining on Metal and Semiconductor by Confined Etchant Layer Technique (CELT)zh_CN
dc.typeArticlezh_CN


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