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Controllable nanogap fabrication on microchip by chronopotentiometry (vol 50, pg 3041, 2005)

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Controllable nanogap fabrication on microchip by chronopotentiometry.pdf (274.9Kb)
Date
2006
Author
Bo Liu
Juan Xiang
Jing-Hua Tian
Can Zhong
Bing-Wei Mao
Fang-Zu Yang
Zhao-Bin Chen
Sun-Tao Wu
吴孙桃
Zhong-Qun Tian
田中群
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  • 物理技术-已发表论文 [4196]
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Abstract
This work aims to solve one of the key issues for developing molecular and nanoscale devices, i.e., how to controllably fabricate nano/angstrom-size gaps on microchips. It has been shown that with a galvanostat and use of the electrode potential as the feedback, we can be used to electrochemically fabricate metallic electrode pair with controlled gap widths ranging from about ten nanometers down to few angstroms. It is based on probing the potential drop in the electrical double layer across the two electrodes during the narrowing of the gap. The process is simple and controllable, allowing rapid fabrication of nanogaps and adaptation of a commonly used electrochemical instrument.
Citation
Electrochimica Acta,2005,50(15):3041-3047
URI
https://dspace.xmu.edu.cn/handle/2288/68716

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