High Frequency Magnetic Property of Dense Fe22Ni78 Cluster Assembled Films
Peng, D. L.
- 材料学院－已发表论文 
Using a plasma-gas-condensation cluster deposition apparatus, Fe2Ni78 clusters are deposited on substrates. When a bias voltage, V-A, is applied to a substrate, neutral and charged clusters are formed in a plasma region and hard-landed on the substrate, forming dense Fe22Ni78 cluster assembled films. For specimens prepared without introduction of O-2 gas into a sputtering chamber (the oxygen flow rate, R-O2 = 0 mol/s), the magnetic coercivity, H-C, decreases, while the saturation magnetization, M-S, increases as V-A is increased up to 20kV. The real part of magnetic permeability, mu' is very small for V-A = 0kV and it becomes a few hundreds for V-A = 5 similar to 20kV. For the dense Fe22Ni78 cluster-assembled films prepared at V-A = 20 kV with R-O2 not equal 0 mol/s, M-S decreases, while the magnetic anisotropy field, H-K, and the electrical resistivity, rho, increase, and the ferromagnetic resonance frequency, f(FMR), increases up to a frequency (f) range of GHz. There are two magnetically optimized states: (1) mu' = 760 at f = 10 MHz for the specimen prepared at V-A = 20 kV with theoxygen flow rate,R-O2 = 0 mol/s and the Ar flow rate, R-Ar = 4.5 x 10(-4) mol/s, and (2) mu' = 370 at 10 MHz and f(FMR) = 1.10 GHz for the one prepared at V-A = 20 kV with R-O2 = 3.7 x 10(-8) mol/s and R-Ar = 4.5 x 10(-4) mol/s. [doi:10.2320/matertrans.MER2008374]