Structure and magnetic properties of Fe-Ti-N films deposited by DC magnetron facing target sputtering
Peng, D. L.
Li, D. X.
- 材料学院－已发表论文 
Using a facing target sputtering equipment, Fe-Ti-N films were deposited on water-cooled and heated substrates under different nitrogen flow ratios, R(N-2). The composition, microstructure, and magnetic properties of the films were investigated by Auger electron spectrosc (AES), X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), and a vibrating sample magnetometer (VSM). The films consist of alpha-Fe, TiNx, and Fe4N, where the volume fraction of these phases varies with R(N-2) and the substrate temperature during sputtering. The alpha-Fe(Ti) films with supersaturated nitrogen exhibit a larger M(s) than the Fe-Ti films. However, H-c first decreases and then increases with increasing R(N-2). This is ascribed to a distortion of the alpha-Fe lattice due to doping of Ti atoms and the compressive stress caused by the incorporation of sufficient nitrogen atoms.