Study of Electrocrystallized n(n≥40) multilayers in Boric Acid Solution
Yin Renhe Shi Wenguang Cao Weimin
- 1998年第4卷 
于钝铜片及玻碳上采用双电解池恒电位结晶制取了［Ｃｏ（０．５ｎｍ～２．２ｎｍ）／Ｐｔ（２．０ｎｍ）］ｎ（ｎ≥４０）金属多层膜．低角度Ｘ射线衍射表明多层膜有良好的周期性调制结构，其Ｂｒａｇｇ峰的半幅值随着钴层电结晶电位的负移和铂层电结晶电位正移而减小．中角度Ｘ射线衍射表明界面上存在ＣｏＰｔ３金属化合物．多层膜的磁滞回线表明该多层膜的易磁化轴平行于膜面，表现出平面磁各向异性．以低过电位镀Ｃｏ（厚度约０．５ｎｍ）的多层膜的垂直方向磁滞回线形状较好，有望表现出垂直磁各向异性．Co(0.5 nm～2.2 nm)/Pt(2.0 nm)] n(n>40) multilayers were prepared by electrocrystallization on copper and glass carbon with a dual cell technique under potential control.The periodical modulated structure of the multilayers was demonstrated by the low angle X ray diffraction. Potential shift negative to the deposition potential of the Co layer and positive to the deposition potential of the Pt layer decreased the value of the full width at half maximum(FWHM) of first Bragg Peak.CoPt 3 alloy was found as the interface of the multilayers by the middle angle X ray diffraction.The hysteresis loops show that the easy magnetization of these multilayers lay in plane,and the multilayers tend to exhibit planar anisotropy.The shapes of the hysteresis loops in perpendicular direction perform well when the Co layers were deposited at a low overpotential, with thickness about 0.5nm.The multilayers probably show perpendicular uniaxial anisotropy.