The Photoelectrochemical Studies of Passive Films on REBAR Electrodes in Simulated Cement Pore Solution
- 1995年第1卷 
利用光电化学方法研究了钢筋在模拟混凝土孔溶液中（ｐＨ＝９．０～１３．８）钝化膜的电子性质，结果表明，钢筋在该溶液中形成的钝化膜是一种无定形的ｎ－型半导体成相膜，膜由多种铁氧化物组成，其组成受溶液中的离子、ｐＨ值、成膜电位影响。腐蚀抑制剂ＮａＮＯ＿２影响钝化膜的组成和生长过程，从而提高钢筋的抗氯离子点蚀能力。The electronic properties of the passive film on REBAR electrodes in simulatedcement pore solution(pH=9.0～13.8)have been investigated using in-situ photoelectrochemicalmethods.The results show that the passive film is composed of mixed oxides of ferrum ,and it is anamorphous,n-type semiconductive film. Variations of pH values,ions in the solution and film-formation potentials can affect the composition of the films. There are two main stages in the growthof the film,with two rate functions characterized by linear relation between the film thickness and thelogarithm of time.The addition of inhibitor NaNO_2 changes the composition,structure and growthkinetics of the film,and therefore improves the resistance of pitting corrosion induced by chloride.