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dc.contributor.author扈心坦zh_CN
dc.contributor.authorHu Xintanzh_CN
dc.date.accessioned2013-11-18T07:43:21Z
dc.date.available2013-11-18T07:43:21Z
dc.date.issued1995-08-28zh_CN
dc.identifier.citation电化学,1995,1(03):353-356.zh_CN
dc.identifier.issn1006-3471zh_CN
dc.identifier.urihttps://dspace.xmu.edu.cn/handle/2288/57143
dc.description.abstract研究了低碳钢在镀铁溶液内经对称交流电处理后在表面形成活化膜的组成及厚度,观察了镀铁层与基体界面的形貌,结果发现,活化膜的厚度随活化电流密度而变化,当电流密度为7Adm ̄(-2)时,在表面形成了一个厚度为20~25nm的洁净活化膜,镀铁层与基体结合牢固。探讨了对称交流电对阴极表面的作用机理。zh_CN
dc.description.abstractThe composition and thickness of active film formed on the surface of cathodemade of low carbon steel after treated by symmetric alternating current(SAC)in ferris chloride bathis studied,and the interfacial morphology of the iron deposit and the substrate is also examined.Theresults show that the active film,which a thickness of 20~25nm can be obtained under SAC densityof about 7A dm ̄(-2) ,so that the adherent iron deposit can be achieved on the active film. The effect ofSAC on cathode surface is discussed in detail.zh_CN
dc.language.isozhzh_CN
dc.publisher厦门大学《电化学》编辑部zh_CN
dc.relation.ispartofseries研究论文zh_CN
dc.relation.ispartofseriesArticleszh_CN
dc.source.urihttp://electrochem.xmu.edu.cn/CN/abstract/abstract9716.shtmlzh_CN
dc.subject无刻蚀镀铁zh_CN
dc.subject对称交流电zh_CN
dc.subject活化zh_CN
dc.subjectIron plating without anodic etchingzh_CN
dc.subjectSymmetric alternating currentzh_CN
dc.subjectActivationzh_CN
dc.title电沉积铁前对称交流电对阴极表面的影响zh_CN
dc.title.alternativeEffect of Symmetric Alternating Current on Cathode Surface Before Iron Depositionzh_CN
dc.typeArticlezh_CN
dc.description.note作者联系地址:大连海事大学镀铁研究所zh_CN
dc.description.noteAuthor's Address: Institue of Iron Plating, Dalian Maritime Universityzh_CN


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