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dc.contributor.author陈鑫耀
dc.date.accessioned2018-11-26T08:50:34Z
dc.date.available2018-11-26T08:50:34Z
dc.date.issued2016-11-15
dc.identifier.citation湖北文理学院学报,2016,37(11):36-39
dc.identifier.issn2095-4476
dc.identifier.otherXFXY201611009
dc.identifier.urihttps://dspace.xmu.edu.cn/handle/2288/165532
dc.description.abstract化学气相沉积(CVD)是一种重要的薄膜制备工艺,其中微波等离子体辅助化学气相沉积(MP-CVD)被广泛用于制备纳米功能薄膜、硬质薄膜和光学薄膜.介绍一种普适型2.45 GHz微波的MP-CVD系统,包括硬件配置、自动控制软件等,并采用该系统在低温条件下制备高质量石墨烯薄膜.
dc.description.abstractChemical vapor deposition(CVD) is one of the important thin film preparation processes, in which the microwave plasma assisted chemical vapor deposition( MP-CVD) is widely used in the preparation of nano-functional film, hard-coating film and optical film. In this paper, a universal type of 2.45 GHz MP-CVD system is introduced, including details of hardware configuration, control software. At last, high-quality graphene film prepared at low temperature by this system is showed.
dc.language.isozh_CN
dc.subject化学气相沉积
dc.subject微波等离子体
dc.subject石墨烯薄膜
dc.subjectChemical vapor deposition
dc.subjectMicrowave plasma
dc.subjectGraphene films
dc.title用于低温生长石墨烯的微波等离子体辅助化学气相沉积系统
dc.title.alternativeMicrowave Plasma Assisted Chemical Vapor Deposition System for Synthesis of Graphene at Low Temperature
dc.typeArticle


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