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dc.contributor.author蔺增
dc.contributor.author巴德纯
dc.contributor.author刘铁林
dc.contributor.author程翔
dc.date.accessioned2017-11-14T03:09:29Z
dc.date.available2017-11-14T03:09:29Z
dc.date.issued2004-07-25
dc.identifier.citation真空,2004,(04):84-87
dc.identifier.issn1002-0322
dc.identifier.otherZKZK200404016
dc.identifier.urihttps://dspace.xmu.edu.cn/handle/2288/156031
dc.description.abstract利用射频等离子体增强化学气相沉积 (RFPECVD)工艺在常温下实现在不锈钢、硅片、玻璃等基底上大面积沉积类金刚石 (DL C)膜。薄膜表面光滑致密 ,与衬底的结合力较高。用 Raman,FTIR,SEM,EDX研究了薄膜的形貌、结构与组分。用栓 -盘摩擦磨损试验机测试了薄膜的摩擦系数。通过优化沉积参数 ,所沉积的DL C膜在与 10 0 Cr6钢球对磨时摩擦系数低于 0 .0 1。在摩擦过程中 DL C膜的磨损机制借助 SEM进行了研究
dc.description.abstractDiamond-like carbon (DLC) films were successfully deposited on the silicon, glass and stainless steel substrates at normal temperature prepared by radio frequency plasma enhanced chemical vapour deposition(RFPECVD) method. The films have smooth surfaces and good adhesions to the substrates. The morphlolgy, microstructre and composition of the films were characterized using Raman spectroscopy, FTIR, SEM. Friction coefficients of the films were tested with ball-on-disk tribometer. By optimizing the deposition parameters, DLC films with friction coefficients lower than 0.01 against the (100Cr6) steel ball were obtained. The wear mechanism of DLC was studied by SEM and micro-Raman analysis.
dc.description.sponsorship教育部博士点基金资助项目 ;批准号 :2 0 0 0 0 145
dc.language.isozh_CN
dc.subject类金刚石膜
dc.subject常温生长
dc.subject等离子体增强化学气相沉积
dc.subjectdiamond-like carbon
dc.subjectnormal temperature growth
dc.subjectRFPECVD
dc.title常温生长类金刚石薄膜的实验研究
dc.title.alternativeMicrostructure and properties of diamond-like carbon deposited at room temperature
dc.typeArticle


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