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dc.contributor.author胡光辉
dc.contributor.author吴辉煌
dc.contributor.author杨防祖
dc.contributor.author王森林
dc.date.accessioned2013-02-17T14:28:03Z
dc.date.available2013-02-17T14:28:03Z
dc.date.issued2004-02
dc.identifier.citation电化学,2004,10(1):94-97zh_CN
dc.identifier.issn1006-3471
dc.identifier.urihttps://dspace.xmu.edu.cn/handle/2288/14824
dc.description通讯联系人, Tel: ( 86_592) 2181436, E_mail: hhwu@ xmu. edu. cnzh_CN
dc.description.abstract[中文文摘]应用循环伏安和阻抗_电位法研究了硫脲(TU)对玻碳电极和镀镍玻碳电极上镍沉积过程的影响.结果表明,在玻碳电极上镍的电沉积呈现明显的电化学成核机理,而在镀镍玻碳电极上则无此特征.TU的存在虽阻碍了Ni晶核的形成,但却能加速晶粒的生长.[英文文摘]Effect of thiourea on nickel deposition at glassy carbon and nickel_deposited glass carbon elect rodes w as invest igated w ith cyclic voltammograms and impetance_potent ial curves. It was found that the nucleat ion processes occurred at the glassy carbon elect rode. However, this characteristics disappeared at the nicked_deposited glassy carbon elect rode. It w as suggested that the presence of thiourea hindered the nucleation processes, yet accelerated g rain growth. Curves of impetance_potent ial could sensitively detect effect of thiourea on nickel depositon and reflect changes in rate_determining step w ith potential.zh_CN
dc.description.sponsorship国家自然科学基金(20073035)资助zh_CN
dc.language.isozhzh_CN
dc.publisher《电化学》编辑部zh_CN
dc.subject硫脲zh_CN
dc.subject电沉积镍zh_CN
dc.subject速控步骤zh_CN
dc.subject阻抗_电位曲线zh_CN
dc.subjectThioureazh_CN
dc.subjectNickel elect rodepositionzh_CN
dc.subjectRate_determining stepzh_CN
dc.subjectImpedance_potent ialzh_CN
dc.title硫脲对镍电沉积的作用zh_CN
dc.title.alternativeEffect of Thiourea on Nickel Depositionzh_CN
dc.typeArticlezh_CN


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