In situ studies of highly oriented Zn-Ni alloy electroplating by using ECSTM
dc.contributor.author | Xie, ZX | |
dc.contributor.author | 谢兆雄 | |
dc.contributor.author | Mao, BW | |
dc.contributor.author | 毛秉伟 | |
dc.contributor.author | Yang, FZ | |
dc.contributor.author | 杨防祖 | |
dc.contributor.author | Zhuo, XD | |
dc.contributor.author | Mu, JQ | |
dc.contributor.author | Tian, ZW | |
dc.contributor.author | 田昭武 | |
dc.date.accessioned | 2012-07-30T02:17:19Z | |
dc.date.available | 2012-07-30T02:17:19Z | |
dc.date.issued | 1998 | |
dc.identifier.citation | CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE,1998,19(4):609-612 | zh_CN |
dc.identifier.issn | 0251-0790 | |
dc.identifier.uri | https://dspace.xmu.edu.cn/handle/2288/13377 | |
dc.description.abstract | Based on a very effective "two-step-coating" method developed for ECSTM tip preparation, highly oriented Zn-Ni alloy electroplating was studied ty in situ ECSTM, The in situ ECSTM observation showed a 3-D growth of the Zn-Ni alloy crystal in the absence of the additives. However, when additive AA-1/DIE was introduced to the plating solution, the Zn-Ni alloy crystal grew along the step and layer by layer. This result indicated that the crystal plane of lower electrochemical activity may be reserved to form the highly oriented layer along the surface of the electrode, The X-ray diffraction patterns showed a highly oriented (100) crystal plane of the deposition along the electrode surface in the presence of AA-1/DIE additive. | zh_CN |
dc.language.iso | zh | zh_CN |
dc.publisher | HIGHER EDUCATION PRESS | zh_CN |
dc.subject | ECSTM | zh_CN |
dc.subject | electrodeposition | zh_CN |
dc.subject | Zn-Ni alloy | zh_CN |
dc.title | In situ studies of highly oriented Zn-Ni alloy electroplating by using ECSTM | zh_CN |
dc.type | Article | zh_CN |
Files in this item
This item appears in the following Collection(s)
-
化学化工-已发表论文 [14469]
CCCE-Journal Paper