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dc.contributor.author陈谋智
dc.contributor.author柳兆洪
dc.contributor.author孙书农
dc.contributor.author邱伟彬
dc.contributor.author刘瑞堂
dc.date.accessioned2016-07-01T08:33:07Z
dc.date.available2016-07-01T08:33:07Z
dc.date.issued1997
dc.identifier.citation半导体光电,1997,(4):16-18+23
dc.identifier.issn1001-5868
dc.identifier.otherBDTG704.003
dc.identifier.urihttps://dspace.xmu.edu.cn/handle/2288/127122
dc.description.abstract用X射线光电子能谱(XPS)技术,测量了射频磁控溅射法(rfMS)制备的硫化锌薄膜(znS:Er3+)的表面及内部构态,认为氧吸附形成的表面构态是产生薄膜界面态和界面陷阱能级的主要原因,对研究器件的激发过程有参考意义。
dc.description.abstractThree schemes For previous design of CCD driving circuit are discussed in detail,Followed by analysis of their advantages and disadvantages.A new design method with simple and easy implementation is proposed.A practical design of TCD1200D driving circuit using this method is given as an example.
dc.description.sponsorship福建省自然科学基金
dc.language.isozh_CN
dc.subject半导体薄膜
dc.subject硫化锌
dc.subjectX射线光电子能谱
dc.subject射频磁控溅射
dc.subjectCCD
dc.subjectDriving Circuit
dc.subjectMonolithic Microcomputer
dc.subjectGAL
dc.title溅射法制备硫化锌薄膜的XPS剖析
dc.title.alternativeA new method For design of CCD driving circuit
dc.typeArticle


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