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dc.contributor.author谢雷
dc.contributor.author罗瑾
dc.contributor.author毛秉伟
dc.contributor.author田昭武
dc.date.accessioned2016-07-01T08:08:11Z
dc.date.available2016-07-01T08:08:11Z
dc.date.issued1996
dc.identifier.citation仪器仪表学报,1996,(S1):193-195+198
dc.identifier.issn0254-3087
dc.identifier.otherYQXB6S1.048
dc.identifier.urihttps://dspace.xmu.edu.cn/handle/2288/125440
dc.description.abstract本文对用于三维超出图形复制加工的约束刻蚀剂层技术进行了可行性研究。分析了刻蚀剂的扩出过程对电化学微细加工分辨率的影响,证明对刻蚀剂层进行约束可使该方法具里高敏感性,并成功地在gAAS单晶上进行了初步的复杂三维微细图形的复制。
dc.description.abstractThe Feasibility of ConFined Etchant Layer Technique(CELT) has been studied.The experiments showed that the conFinement of the etchant layer can make this technique possessing the characteristic of distance sensitivity which is necessary For 3-dimensional microfabrication.The replication of the complicated 3-dimensional micropatterns on the single crystal GaAs based on the CELT was realized.The preliminary results indicated that CELT can really be used as a 3-dimensional micro-Fabrication technique.
dc.description.sponsorship国家自然科学基金
dc.language.isozh_CN
dc.title用于三维超微图形复制加工的约束刻蚀剂层技术研究
dc.title.alternativeStudy on the ConFined Etchant Layer Techniaue For 3-Dimensional Microfabrication
dc.typeArticle


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