Effect of chloride ion on electrocrystallization of copper on glass carbon electrode

Abstract

The initial stage of copper electrodeposition and the influence of chloride ions on the nucleation and growth of copper on glass carbon from acid sulphate solution were studied by using the cyclic voltammetry and the chronoamperometry method. Instantaneous nucleation with three-dimensional growth is found for the solutions either with or without chloride. Obviously, chloride ions increase the nucleation rate and the nuclear number density of nuclei at the surface. Since the deposits are smooth, bright at high nuclear number densities, it can be concluded that chloride ions effectively promote the smooth and brightness of surface. The higher nuclear number densities are obtained at 10 similar to 20 mg . L-1 of chloride ions. Maintaining the optimum level chloride ion concentration is beneficial to electrodeposits.