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dc.contributor.authorLi, GR
dc.contributor.authorTong, YX
dc.contributor.authorWang, Y
dc.contributor.author王野
dc.contributor.authorLiu, GK
dc.date.accessioned2012-04-11T01:47:16Z
dc.date.available2012-04-11T01:47:16Z
dc.date.issued2003-10-10
dc.identifier.citationELECTROCHIMICA ACTA,2003,48(27):4061-4067zh_CN
dc.identifier.govdochttp://dx.doi.org/10.1016/S0013-4686(03)00563-2
dc.identifier.issn0013-4686
dc.identifier.urihttps://dspace.xmu.edu.cn/handle/2288/12042
dc.description.abstractThe elect rodeposition of Lu-Ni alloy thin films from Lu(III) and Ni(II) solutions was studied in a nonaqueous dimethysulfoxide (DMSO). Different substrates have been used (platinum and copper), and the effect of them on the electrochemical behavior of the studied ions is shown. The obtained Lu-Ni alloy thin films were subjected to scanning electron microscopy (SEM), energy dispersive X-ray analysis (EDX) and X-ray diffraction analysis (XRD). The lutetium content in Lu-Ni alloy thin films increases as the potential was made more cathodic, reaching a maximum value of 28.77 at.%, and then decreases. The films were amorphous. After heat treatment of crystallization at 520 degreesC for 1 h, the alloy phase of Lu-Ni can be found in XRD patterns. (C) 2003 Published by Elsevier Ltd.zh_CN
dc.language.isoenzh_CN
dc.publisherPERGAMON-ELSEVIER SCIENCE LTDzh_CN
dc.subjectLu-Ni alloy thin filmszh_CN
dc.subjectelectrodepositionzh_CN
dc.subjectstrippingzh_CN
dc.subjectdimethysulfoxide (DMSO)zh_CN
dc.titleElectrodeposition of Lu-Ni alloy thin filmszh_CN
dc.typeArticlezh_CN


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