Controllable nanogap fabrication on microchip by chronopotentiometry
Date
2005-04Author
Bo Liu
Juan Xiang
Jing-Hua Tian
Can Zhong
Bing-Wei Mao
毛秉伟
Fang-Zu Yang
杨防阻
Zhao-Bin Chen
Sun-Tao Wu
Zhong-Qun Tian
田中群
Collections
- 化学化工-已发表论文 [14469]
Abstract
This work aims to solve one of the key issues for developing molecular and nanoscale devices, i.e., how to controllably fabricate nano/angstrom-size gaps on microchips. It has been shown that with a galvanostat and use of the electrode potential as the feedback, we can be used to electrochemically fabricate metallic electrode pair with controlled gap widths ranging from about ten nanometers down to few angstroms. It is based on probing the potential drop in the electrical double layer across the two electrodes during the narrowing of the gap. The process is simple and controllable, allowing rapid fabrication of nanogaps and adaptation of a commonly used electrochemical instrument. (c) 2005 Elsevier Ltd. All rights reserved.
Citation
ELECTROCHIMICA ACTA,2005,50(15):3041-3047URI
http://dx.doi.org/doi:10.1016/j.electacta.2004.12.041https://dspace.xmu.edu.cn/handle/2288/11195