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dc.contributor.authorGu,Jiandong
dc.contributor.authorFeng,Zhiqing
dc.contributor.authorNiu,Jinhai
dc.contributor.authorLi,Dongming
dc.contributor.authorBenstetter,Guenther
dc.contributor.authorLiu,Dongping
dc.contributor.author刘东平
dc.date.accessioned2011-07-23T10:14:07Z
dc.date.available2011-07-23T10:14:07Z
dc.date.issued2010-08
dc.identifier.citationVACUUM,2010,85(2):253-262zh_CN
dc.identifier.issn0042-207X
dc.identifier.urihttp://dx.doi.org/doi:10.1016/j.vacuum.2010.06.005
dc.identifier.urihttps://dspace.xmu.edu.cn/handle/2288/10276
dc.description.abstractFluorocarbon (FC) films have been deposited using pulsed and continuous wave (cw) radio frequency (rf) plasmas fed with hexafluoroethane (C2F6), octafluoropropane (C3F8), or octafluorocyclobutane (C4F8). The effects of feed gases used, discharge pressure, rf power, substrate positions and discharge modes (pulsed or cw) on the deposited films are examined. Film properties are determined using X-ray photoelectron spectroscopy, atomic force microscopy, and static contact angle measurements. The contact angles of FC films are well related to their compositions and structures. Feed gases used, discharge pressure, rf power, substrate positions and discharge modes strongly affect the morphology of the resulting film, as revealed by atomic force microscopy. Optical emission spectrometry measurements were performed to in-situ characterize the gas-phase compositions of the plasmas and radicals' emission intensities during film deposition. Correlations between film properties, gas-phase plasma diagnostic data, and film growth processes were discussed. The film growth in pulsed or downstream plasmas was controlled by the surface migration of radicals, such as CF2 towards nucleation centers, which result in the deposition of FC films with less cross-linked nature and rougher surfaces. These results demonstrate that it is possible to control film compositions and surface structure by changing deposition parameters. (C) 2010 Elsevier Ltd. All rights reserved.zh_CN
dc.description.sponsorshipNational Science Foundation of China [10405005]zh_CN
dc.language.isoenzh_CN
dc.publisherPERGAMON-ELSEVIER SCIENCE LTDzh_CN
dc.subjectFluorocarbon filmszh_CN
dc.subjectOptical emission spectroscopyzh_CN
dc.subjectContact anglezh_CN
dc.subjectRadio frequency plasmaszh_CN
dc.titleComparison of fluorocarbon film deposition by pulsed/continuous wave and downstream radio frequency plasmaszh_CN
dc.typeArticlezh_CN


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